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Pepperpot Emittance Meter
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| product name: | Pepperpot Emittance Meter |
| product category: | ion beam diagnostics |
| catalog no.: | 22003 |
| datasheet: |  download |
The Pepperpot Emittance Meter allows the measuring of ion beam emittance from extracted ion beams of EBIS/T sources. Additionally, the use in conjunction with other ion sources (e.g. ECR sources, Penning sources) is possible as well as the 2D-local measuring of the intensity profile inside the electron and x-ray beam.
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Setup
The Pepperpot Emittance Meter is an Ion Beam Imaging System which allows to detect beams of ions, neutrals, electrons as well as X-rays in real time.
The system is mounted to a single DN 160 CF flange with a linear motion vacuum feedthrough, SHV high voltage feedthroughs, glass viewport und camera fixture.
The main components of the system are the pepper pot-like pinhole mask, the microchannel plate and phosphor screen assembly, the mirror, and the CCD camera with an attached macro zoom lens.
The system creates an image of the beam by converting the incident beam to secondary electrons using the MCP (Microchannel plate). The electrons are then accelerated onto a phosphor screen producing visible light which can be monitored through the glass vacuum window.
The pinhole mask, made of a tungsten foil 200 ėm thick, covers a circular grid pattern, with a diameter of up to 50 mm, of 200 ėm holes spaced by 1 mm. Other pattern geometries are possible depending on the MCP dimension.
The chevron type MCP with a gain of up to 1∙107 is backed by a fast phosphor screen. The distance between the pepper pot mask and the MCP is adjustable up to 60 mm.
The mirror behind the phosphor screen reflects the beam image to the macro zoom lens of the CCD camera. The shutter time of the camera of 10 ės allows to measure time-resolved images of the beam.
Real time beam imaging and emittance measurement (screenshots):
  
supplies and accessories
CCD camera (B&W, SXGA 1200x960, 30 fps, IEEE 1394b interface) with macro zoom lens
Image processing system (PC, connector cables, imaging software)
Analysing software
High voltage supplies (0
2kV supply and 0
5 kV supply, 19-inch rack, voltage display, manual and remote control, SHV cables)
DN 160 CF vacuum vessel upon request
Parameters:
Maximium beam diameter: 50 mm, larger diameters upon request depending on the MCP
dimensions
Maximum beam current: 1 nA for ions and neutrals, 0.5 Watt for electrons (higher currents with additional attenuation grid)
Maximum energy: 50 keV for ions, higher energies with additional layer on the MCP (higher energies and currents are possible but will reduce the MCP life time)
Maximum operating pressure: 2∙10-6 mbar
Maximum baking temperature: 200 °C
Vertical travel of the system: 100 mm
Manual linear motion feedthrough (other drive and vertical travel upon request)
Minimum mask hole diameter: 50 ėm (material, thickness, dimensions and pattern upon
request)
the scope of delivery includes:
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