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Ion irradiation facility M
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| product name: | Ion irradiation facility M |
| product category: | Ion irradiation facilities |
| catalog no.: | 10002 |
| datasheet: |  n/a |
Compact irradiation facility for experiments with highly charged ions (HCI) and molecule fragments with charge state separation by an analysis magnet. The length of the beamline is about 2,5m x 1,5m.
the following specifications are available:
- continuous ion beams
- pulsed ion beams from 10ns to 100 micro seconds per pulse
- ion beams with diameter of 500 micro meters and larger
- on request with electron beam charging by external ion injection (external ion source with quadrupole deflector integrated into the beam line)
The beamline is equipped with a target chamber (based and dimensioned on customer specification)
Target chamber, magnet, quadrupole deflector and ion source can be separated by all metal vacuum valves.
The used ion source (Dresden EBIT3, Dresden EBIS2, Dresden EBIS-A, Dresden EBIS-SC) can be operated on ground potential or on a high voltage terminal.
Ion energies up to 20 keV x q (q = ion charge state) with sources on ground potential can be realized. On high voltage terminal, correspondingly higher values can be reached.
On customer requirements, an ion deceleration device can be integrated.
On request we offer the complete vacuum supplies (pre-vacuum pumps, turbomolecular pumps, measurement devices), matching to the beam line dimensions.
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optional products:
Dresden EBIT3 | 
Dresden EBIS2 | 
Dresden EBIS-A | 
Deceleration lens system |
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