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Applications

Nanostructures

Single ion hits create structures on the surface on a nanoscale the dimensions of which are found to depend on the charge and kinetic energy of the projectile but also on the conducting properties of the surface.

The high emission yield of secondary particles provides the basis for improvements and new techniques of surface modification and analysis, such as TOF-SIMS using highly charged ions.

Xe20+ at HOPG Ar16+ at MICA
HOPG 20 nm x 20 nm
Xe20+ at 4 keV
(by courtesy of Dr. Facsko, Forschungszentrum Dresden-Rossendorf)
MICA 250 nm x 250 nm
Ar16+ at 8 keV
(by courtesy of Prof. Schleberger, University Duisburg-Essen)


Noble Gas Focused Ion Beam

There is a great demand for beams of noble gases in Focused Ion Beam (FIB) technology with applications in material science and semiconductor industry.

The Dresden EBIT has been employed at the NanoFIB machine at LPN/CNRS in Marcoussis, France.

It not only meets the requirements, such as a small ion beam emittance and reliability, but is also simple to implement and to operate.
NanoFIB-EBIT set-up
Si sample Si sample edge High-contrast SEM-images of a silicon sample obtained with the focused helium beam provides an indication of an ion beam diameter in the sub-micrometer range.



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